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Degradation processes of platinum thin films on a silicon nitride surface

Groenland, A.W. (2006) Degradation processes of platinum thin films on a silicon nitride surface.

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Abstract:In this project, the high temperature stability of platinum thin films, as used in silicon microreactors, is studied. Meander shaped platinum thin films (typically 100-200 nm) are used as heaters in silicon technology based microreactors to heat a catalyst up to 700C for the catalytic partial oxidation of methane to synthesis gas. It was found these platinum thin films suffer from physical degradation like hillock and void formation, leading to a degradation of the electrical properties. In this project, the effects of high temperature treatments on the resistivity and temperature coefficient of resistance (TCR) of platinum thin films, sputtered on silicon nitride coated substrates with various adhesion layers, are investigated and a design solution is presented to optimize the high temperature stability
Item Type:Essay (Bachelor)
Faculty:EEMCS: Electrical Engineering, Mathematics and Computer Science
Subject:53 electrotechnology
Programme:Electrical Engineering BSc (56953)
Link to this item:https://purl.utwente.nl/essays/478
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