Heat transfer between plasma and substrate surface during Pulsed Laser Deposition

Willemse, R. and Carelsen, S. (2013) Heat transfer between plasma and substrate surface during Pulsed Laser Deposition.

Abstract:During Pulsed Laser Deposition the energy of the laser pulse is absorbed by the target, evaporating a small volume of target material. The laser beam converts this into a plasma plume which expands in the direction of the substrate. The kinetic energy of the species is transferred into the substrate surface during deposition, increasing the surface temperature. The surface temperature drops to the initial value in a time τ. If the frequency of the PLD laser is higher then 1/τ, the average temperature of the substrate will increase and this affects the mobility of the species. In order to measure this temperature increase a Resistance Temperature Detector (RTD) is mounted on the substrate, the thickness of the RTD is ~ 30nm. Because the RTD is made of a very little material the sensitivity and response time of this sensor is expected to be higher than that of commercially sold RTDs, because these have a protective sheet. The RTD is taken into a Wheatstone bridge circuit to measure the resistance‐difference accurate. . This RTD is calibrated and for both platinum and gold an expected, linear relation between temperature and resistance is found. The temperature coefficient of the platinum meander was within a 10% accuracy of the theoretical value. Where that of gold was 50% smaller then the theoretical value. In order to check if the response time of the RTD were sufficient both a excimer and Nd:YAG laser were used to see the reaction on a sequence of pulses. During both experiments the meander was heated enough to fluidize. This caused the meander resistors to get interrupted, and no useful is recorded.
Item Type:Essay (Bachelor)
Faculty:TNW: Science and Technology
Subject:33 physics
Programme:Applied Physics BSc (56962)
Link to this item:http://purl.utwente.nl/essays/63817
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