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Thermal control and rate of deposition system of chemical vapor deposition at atmospheric pressure ; production of thin tin-oxide films by an APCVD process

Smit, Maarten Jan (2012) Thermal control and rate of deposition system of chemical vapor deposition at atmospheric pressure ; production of thin tin-oxide films by an APCVD process.

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Abstract:This report covers the design and manufacturing of a new CVD reactor for chemical vapor deposition (CVD) of tin-oxide to glass as well as several related issues such as written process control software, chemical process information and test run results. The CVD process is one step in the production of liquid crystal displays and many other applications. Currently CTI has a working discontinuous atmospheric pressure (APCVD) reactor that needs replacement to allow a process with more degrees of freedom as to conduct a more elaborate research. The CVD process as carried out at CTI is a process that is chemically not fully understood yet, but results of deposition of tin-oxide are measured. The principles behind the general process as well as the specific process carried out at CTI are treated up to certain detail in this report as well as several important influences on the process. The design of the new APCVD reactor concerns in fact not the entire reactor, but rather all the involved electrical equipment that is stored in a so called ‘control box’. This control box houses all the mass flow control, electrical and temperature control equipment as well as equipment for the rotational motor of the heater that is necessary for the CVD process. The control box’s design is optimized using 3D CAD software and both an electrical circuit as a gas flow circuit is drawn of the equipment inside. To control the process digitally via a PC, it was necessary to communicate with the mass flow controllers (MFCs) and hence software has been written to do so. for the equipment came without any control software. The written program, named Deposition Control, is fully explained so anyone acquainted with the used software to write the program can understand and later on adapt the program if necessary. Finally after finishing the assembly of the equipment and all the connections inside the reactor, several test runs have been carried out to assure proper functioning of the total reactor. During these tests, several improvements have been made to the equipment as well as to the Deposition Control program. This report is concluded with several recommendations for better control of the CVD process in future use.
Item Type:Essay (Master)
Clients:
CTI
Faculty:ET: Engineering Technology
Subject:52 mechanical engineering
Programme:Mechanical Engineering MSc (60439)
Link to this item:http://purl.utwente.nl/essays/63950
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