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Development and characterization of an HNA etching process for realization of big sensor tubes

An, X. (2020) Development and characterization of an HNA etching process for realization of big sensor tubes.

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Embargo date:3 December 2022
Abstract:The microfluidic channel is the significant structure in a microflow sensor, which ensures to measure the laminar flow. A larger round channel can increase the flow rate and the measurement range and has benefits for increasing the accuracy and sensitivity of the micro Coriolis massflow sensor. The isotropic etching can etch a round channel based on the buried channel technology. The isotropic gas etchant such as Xenon difluoride can do that, but it will cost more after etching to a large diameter. HNA systems(hydrofluoric, nitric, acetic acid solution), as a wet isotropic etchant, can etch a large round channel in a low-cost way. In this thesis, an etching bath with an agitation system is designed and developed to meet the needs of HNA systems for rotation. After that, the round buried channel under a trench with 10 micron width and 65 micron depth is formed by HNA solution with a diameter of 100 micron and a smooth channel wall.
Item Type:Essay (Master)
Clients:
UT IDS MSS
Faculty:EEMCS: Electrical Engineering, Mathematics and Computer Science
Subject:53 electrotechnology
Programme:Electrical Engineering MSc (60353)
Link to this item:http://purl.utwente.nl/essays/85268
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